Yongpan Hu, Fengjiao Chen, Pan Ding, Hui Yang, Junmei Chen, Chenyang Zha and Yanguang Li* Designing Effective Si/Ag Interface via Controlled Chemical Etching for Photoelectrochemical CO2 Reduction. J. Mater. Chem. A 2018, 6, 21906-21912. (invited article for "the Emerging Investigators" themed issue)
Li group-李彦光课题组