Pan Ding, Yongpan Hu, Jun Deng, Junmei Chen, Chenyang Zha, Hui Yang, Na Han, Qiufang Gong, Leigang Li, Tingting Wang, Xuan Zhao, and Yanguang Li* Controlled Chemical Etching Leads to Efficient Silicon-Bismuth Interface for Photoelectrochemical CO2 Reduction to Formate. Mater. Today Chem. 2019, 11, 80-85. (invited article for the special issue of "low dimensional materials for photocatalysis and electrocatalysis").
Li group-李彦光课题组